Sencera’s LPS-48 is a Plasma Enhanced Chemical Vapor Deposition Source, that deposits a variety of thin films at fast rates. Films such silicon, silicon dioxide, silicon nitride, and several transparent conducting oxides (TCO's) have been deposited at rates in excess of 500 angstrom-meters per minute. The LPS-48 exposes the substrate to low temperature (from room temperature to 120 C) and is capable of uniform large area deposits. This facilitates deposition onto new materials such as PET and other non-specialized plastics. |